载荷对类富勒烯基氢化非晶碳薄膜摩擦磨损性能的影响
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- 发布时间:2014-03-22
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系统研究了载荷对类富勒烯基氢化非晶碳薄膜(fullerene-likehydrogenatedamorphouscarbonfilm,FL?C:H)摩擦磨损性能的影响。研究结果表明,随着载荷的增加,FL?C:H薄膜的摩擦因数和磨损率都不断减小。利用Hertz弹性接触理论计算了薄膜摩擦过程中实际接触面积的变化。随着载荷的增加,实际接触面积增大,但是接触面积的增速比载荷的增速慢,即接触面积和载荷的比值随着载荷的增大而减少,这是FL?C:H薄膜摩擦因数降低的一个主要原因。此外,摩擦界面处低剪切力氢化碳转移膜的形成是FL?C:H薄膜具有低摩擦的另一个主要原因。 The friction and wear behaviors of fullerene-like hydrogenated carbon films sliding against Si3N4 balls were investigated at different contact loads from 1 to 20 N on a reciprocating sliding tribometer in the air. It was found that the films exhibited non-Amontonian fi'iction behavior, with the friction coefficient decreasing with an increase in contact load. At the 1 N contact load, the friction coefficient was ~0.112, whereas at the 20 N load it decreased to a super-low value (-0.009). The main mechanism responsible for low friction and wear under varying contact stresses was governed by the third bodies (also known as transfer films) that form and reside in the sliding interface. It was argued that the tribochemistry of the transfer films was responsible for the observed friction behavior: hydrogenated carbon-containing species were responsible for very low fi-iction coefficient, wear, and interfacial shear stress. The link between interfacial tribochemistry and the pressure-induced transfer film shear strength provided the chemical-mechanical mechanism for explaining friction and wear differences in varying environments.
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