纳米SiO2抛光液的制备及在蓝宝石抛光中的应用

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To meet the ultra-precision machining requirement of single-crystal sapphire substrate for advanced electronic products, such as LED, one kind of silica-based slurries was prepared and its properties were investigated by scanning electronic microscope （ SEM ）, Laser particle size analyzer and particle counting instrument. The polishing performance of as-prepared slurry on LED sapphire substrate was studied, and the polished sapphire surface was inspected by FRT profilometer, Candela optical surface analyzer （ OSA）, and atomic force microscope （ AFM ）. The results indicate that as-prepared slurry exhibits excellent polishing performance and the average roughness of obtained sapphire surface without scratch and pit is below 0. 2 nm.制备一种纳米氧化硅抛光液，采用扫描电子显微镜、激光粒度仪、颗粒计数仪等对其物性参数进行表征；使用该抛光液对LED蓝宝石衬底进行机械化学抛光，采用轮廓仪、表面缺陷检测设备、原子力显微镜等对抛光后的蓝宝石衬底表面进行表征。结果表明，制备的纳米氧化硅抛光液对LED蓝宝石衬底具有优异的抛光性能，抛光后的表面无划伤、无腐蚀坑，且粗糙度小于0．2nm。